What's New | SII NanoTechnology Inc.

06/17/2008	Launch of the SEA6000VX Fluorescent X-ray Analyzer equipped with High-Speed Mapping Measurement Function
05/20/2008	The ULTRA plus, a scanning electron microscope by Carl Zeiss SMT
08/01/2007	Launch of the SFT9550 High-Performance Fluorescent X-Ray Coating Thickness Gauge
07/26/2007	SII NanoTechnology Strengthens its Overseas Fluorescent X-ray Analysis Business
04/17/2007	SII NanoTechnology Releases SIR-7, a Photomask Defect Repair System for 45-nm Nodes
02/20/2007	Establishment of The Yokohama Demonstration Laboratory
12/04/2006	Releases Two Models of Scanning Probe Microscope
08/01/2006	NVision 40: High-end multi-functional CrossBeam® workstation for Materials Analysis, Semiconductor Manufacturing and Life Science Applications
07/13/2006	XVision 300 FIB/SEM Nano-Scale Inspection and Defect Analysis Tool launched
06/27/2006	Announcing the Release of the SEA1200VX Element Monitor, a Highly Sensitive Fluorescent X-Ray Analyzer
05/16/2006	Release of Pre-Clinical Imaging System
05/10/2006	Launch of the SFT9500 High-Performance Fluorescent X-Ray Coating Thickness Gauge
03/16/2006	Carl Zeiss NTS and SII NanoTechnology announce global strategic alliance on Nanotechnology Solutions
01/17/2006	SII NanoTechnology and Carl Zeiss NTS announce Sales Alliance
11/09/2005	Releases the "SMI3000TB Series," the World's First Triple Beam System
11/09/2005	Releases SPR6300 Photomask Repair System for the 65-nm node generation and beyond
11/09/2005	Releases "SIR8000," the World's First Liquid Crystal Photomask Defect Repair System

06/09/2008	Notice of Server Maintenance
04/27/2007	SIINT Announces Changes in Management
01/05/2007	Change of Distribution & Service Network for Thermal Analysis System
10/26/2005	Acquisition of the US Radiant Detector Technologies' X-ray Detector Business
10/26/2005	Establishes a Wolly-owned US Subsidiary
08/25/2005	Introducing the New XRF Analyzer, Soil Monitor SEA1100
07/26/2005	Started Massproduction of Fluorescent X-ray Analyzers and Fluorescent X-ray Coating Thickness Gauges at China-based Subsidiary
07/26/2005	Corporate Headquarters Relocation
07/01/2005	Releases "NonoNavi" Station, a Control Station for Scanning Probe Microscopes
03/14/2005	Introducing SIR7000FIB, a Photomask Defect Repair System for the 65-nm Node Generation
11/30/2004	Releases 2 Models of FIB-SEM Hybrid System Compatible with 200/300 mm Wafer
11/01/2004	Chinese Subsidiary Established in Shanghhai
10/14/2004	Achieves ISO/IEC17025 Accreditation, an International Laboratory Accreditation Standard
09/01/2004	Strategic marketing alliance with KLA-Tencor for sales of Nanopics in Europe and the U.S.
06/25/2004	SII NanoTechnology to supply AFM heads for KLA-Tencor "Profiler"
05/11/2004	Shanghai Office Relocation
03/03/2004	Introducing the New FIB-SEM Hybrid System "SMI3050SE"
11/28/2003	SII Latest Topics on FIB
11/27/2003	Scientific Instruments Division to spin off from SII
10/01/2003	Welcome to the revamped SII Scientific Instruments Division home page.