SII NanoTechnology Inc., will release in April the photomask defect repair system "SIR7000FIB", a system that repairs defects on photomasks for semiconductor devices which accommodate the 65-nm node.

SIR7000FIB is a system that repairs microscopic defects using focused ion beams (FIBs). This system is a next generation system offering the ease-of-use of the photomask defect repair system "SIR5000" released in January 2003 for the 90-nm node, while realizing 65-nm node resolution and accuracy as well as reducing damage.

The "SIR7000FIB" model to be released was developed based on the technological accomplishments through joint research by Semiconductor Leading Edge Technologies, Inc., Dai Nippon Printing Co., Ltd., Toppan Printing Co., Ltd. and Hoya Corporation.

SII NanoTechnology sold the world's first FIB-based photomask defect repair system in 1985, and maintains a high industry share both domestically and internationally. The new SIR7000FIB model is to be sold to photomask manufacturers both domestically and internationally.

[SIR7000FIB Main Features]

1. 10-nm or less (3σ) repair accuracy
The new system features improved repair accuracy, from the conventional 15 nm (3σ) to 10 nm (3σ). A new ion beam optical system improves ion beam radiation position stability and sharpens the beam focus, thereby enabling detailed observation of microscopic defect shapes. As a result, the system is capable of identifying and repairing defect shapes with higher fidelity. In addition, with a temperature control system mounted in the chamber unit to reduce temperature variance, the new system exhibits a reduction in temperature dependent drift.

2. CAD linkage function
By identifying the normal pattern of a defect area from the graphic data of EB*4 used in semiconductor layout design and superimposing the pattern on the defect area, the system enables repair based on a shape designed as close as possible to the normal pattern. The system also enables repair of complex shapes such as OPC shapes with higher fidelity.

3. SMIF transport mechanism
The new model utilizes a photomask SMIF transport mechanism. The system can load a photomask carried by an SMIF pod*5 into the chamber via a super clean load mechanism, preventing the adherence of particles (microscopic contaminants) to the photomask.

[Price] SIR7000FIB unit: 550 million yen
[Sale Start Date] April 15, 2005

SII News Release