SII NanoTechnology Inc. will release in December "SIR8000," the world�fs first* photomask defect repair system that repairs the photomask defects of liquid crystal and other flat panels. (*As an FIB large-sized liquid crystal photomask repair system)

With the development of high-definition flat panel displays (FPD), advances have been made in areas such as liquid crystal and color filter technology while the practical application of gray tone masks has increased, resulting in a markedly intensified photomask demand. In addition, improvements in photomask yield by photomask repair have become increasingly critical for the liquid crystal industry that continually calls for cost reductions. Amid the current environment, the number of defects that are difficult to repair using conventional laser repair systems has greatly increased, thereby increasing the necessity for a focused ion beam (FIB) based high-precision repair system used for semiconductor photomask repair.

SII NanoTechnology commenced selling the world�fs first FIB-based semiconductor photomask defect repair system in 1985, and maintains a high industry share both domestically and internationally. Using this technology, the company released a white defect repair system for 508 mm x 609 mm liquid crystal masks in 1993.

The new SIR8000 liquid crystal photomask defect repair system to be released this time introduces FIB repair technology used in semiconductor photomask defect repair systems into liquid crystal mask repair, realizing high repair accuracy for both white and black defects. The layer formed by the carbon deposition function of the FIB used for white defect repair has a high bonding strength, resulting in repairs of high reliability. In addition, the system supports the repair of half-tone film masks that now have increased practical applications. The SIR8000 is the world�fs first photomask repair system that utilizes FIB technology and supports FPD large-size photomasks of the 7th generation or later, providing effective high-precision repair of photomasks that have become increasingly difficult to fabricate with advances in larger photomask size.

[Features]

[System Size]
W6000 x D7200 x H3600 mm

[Price]
SIR8000 system     1 billion yen

[Sale Start Date]
December 1, 2005

[About SII NanoTechnology Inc.]
SII NanoTechnology Inc., a subsidiary of Seiko Instruments Inc. (SII), is a leading company in the development of advanced, leading edge measurement and analysis instruments. Its head office is located in Tokyo, Japan. It was the first Japanese company to produce SPM and Focused Ion Beam (FIB) Systems. The company's products line-up also includes XRF Analyzers, XRF Coating Thickness Gauges, Thermal Analysis Systems, ICP-OES, ICP-MS and Mask Repair Systems. Many of these products are utilized to support leading edge research and development. Additional information about the company is available on the Internet at http://www.siint.com/en/