| Overview |
SIR5000 is a system developed for repairing defects on photomasks and reticles for semiconductor devices. This system can repair extremely small and complicatedly shaped defects on photomasks, such as phase shift masks and binary masks, with high accuracy. |
| Features |
Successfully miniaturized the beam diameter by using an advanced ion optics system. In contrast with past models, it can observe and repair the microscopic defects.
2. Achieved a repair accuracy of 15nm (3σ), making highly accurate repair possible.
3. Uses a Windows ® 2000 based operating system and features a newly developed GUI environment.
4. Able to makes observations and repairs using secondary ion images as well as secondary electron images. |
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